[doi:10 1063/1 3597787]“
“Oats (Avena sativa) have received

[doi:10.1063/1.3597787]“
“Oats (Avena sativa) have received considerable interest for their high content of soluble and insoluble fibre and for their high fermentability upon applying probiotic lactic acid bacteria (LAB) In the present study Box-Behnken optimization design was used to optimize three different levels of oat sucrose and starter culture concentration on the final viable cell population of Lactobacillus plantarum for the development of a fermented drink A second-order polynomial response surface

equation was developed indicating the effect of the studied variables on L plantarum growth Contour maps generated using the response GDC-0973 ic50 surface equation showed that the experimental variables significantly affected the growth of the L plantarum The optimized factors (5 5% oats 1 25% sugar and 5% moculum) were then applied to prepare a fermented drink to obtain a growth of 104 log CFU/ml The shelf life of the fermented drink was monitored over a period of 21 days Physical parameters such as colour and viscosity were also measured along with the microbiological count pH and titrable acidity beta-Glucan level remain unchanged during the fermentation and also during the entire storage period (C) 2010 Elsevier B V All rights reserved”
“The gene HtNB

confers non-lesion resistance to the fungal pathogen Exserohilum turcicum in maize. To map this gene, we developed two F-2 populations, P111 (resistant line) x HuangZao 4 (susceptible line) and P111 x B73 (susceptible). HtNB was located on chromosome 8.07 bin, flanked by MAC216826-4 BAY 73-4506 inhibitor and umc2218 at distances of 3.3 and 3.4 cM, respectively. HtNB appears to be a new gene responsible for resistance to northern corn leaf blight. Functions of the genes in the region between umc1384 and umc2218 were predicted. In addition, several genes were found to be related to disease resistance, such as the genes encoding Ser/Thr protein kinase and protein-like leaf senescence.”
“The breakdown of high-K (HK) stack gate dielectrics is shown to be analogous to the failure of ultrathin SiO(2)-based oxides showing progressive breakdown. The breakdown of a HK BKM120 price stack is shown to occur in two phases.

First, one or several percolation paths are formed in the SiO(2)-based interfacial layer. Then, these partial breakdowns propagate into the HK through defect generation in this layer. This propagation phase is equivalent to the progressive breakdown local degradation phenomenon. As a consequence of this analogy, the reliability assessment tools developed for ultrathin single-layer oxides can also be used without significant changes to assess the reliability of HK stacks. This analogy is so strong that the experimental distinction between HK propagation and conventional progressive breakdown appears to be rather difficult. However, the residual time distribution from first breakdown to final oxide failure is shown to be significantly different for both processes at low failure percentiles.

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